Overview of Round shape Titanium sputtering target vacuum coating material 2N5 purity customized size
Metal powder is a common form of metal that has been processed into fine particles, ranging from a few micrometers to over 100 microns in diameter. It plays a crucial role in various industrial applications due to its unique properties and versatility.
Features of Round shape Titanium sputtering target vacuum coating material 2N5 purity customized size
Physical Characteristics
Particle Size: Ranging from nanometers to hundreds of micrometers, the size distribution significantly influences the powder’s flowability, packing density, and sintering behavior.
Shape: Particles can be spherical, irregular, flake-like, or dendritic, each shape affecting the final product’s mechanical properties and surface finish.
Purity: Depending on the production method, metal powders can achieve high levels of purity, critical for applications like electronics and aerospace where impurities can degrade performance.
Density: While less dense than their solid counterparts due to the presence of air between particles, metal powders can be densely packed during processing to approach the density of the solid metal.
Chemical Properties
Reactivity: Some metal powders, particularly aluminum and titanium, are highly reactive with air and moisture, necessitating careful handling and storage under inert atmospheres or vacuum.
Oxidation: Exposure to air can lead to surface oxidation, forming a passive layer that affects sintering and other processes. This can be managed through surface treatment or use of protective atmospheres.
(Round shape Titanium sputtering target vacuum coating material 2N5 purity customized size)
Parameters of Round shape Titanium sputtering target vacuum coating material 2N5 purity customized size
Title: Customized Round Shape Titanium Sputtering Target for Vacuum Coating Applications with 2N5 Purity and Flexible Size Specifications
Introduction:
In the realm of advanced materials processing, titanium sputtering targets play a pivotal role in depositing high-quality coatings for various industrial applications. Our cutting-edge technology allows us to manufacture round-shaped titanium targets with unparalleled purity, specifically tailored to meet your customization needs. This technical overview delves into the key specifications of our 2N5 purity targets, highlighting their suitability for vacuum coating processes without adhering to a fixed format.
Material Composition:
The core material of our sputtering targets is pure titanium (Ti) with a 99.999% (2N5) purity level. This level ensures an extremely high concentration of titanium atoms, minimizing impurities that could potentially compromise the quality and performance of the deposited coatings. The 2N5 standard is commonly used in demanding applications where a high level of purity is essential, such as semiconductor fabrication, aerospace, and medical devices.
Shape and Design:
Our round shape design is versatile and easily adaptable to different sputtering systems. The targets can be customized to various diameters, ranging from a few centimeters to tens of centimeters, depending on your specific requirements. The uniformity of the round shape promotes efficient sputtering, ensuring a consistent distribution of titanium particles during the coating process.
Surface Finish:
Careful attention to detail is given to the surface finish, which is critical for optimal sputtering efficiency and minimizing substrate contamination. Our targets are typically polished to a mirror-like surface, ensuring minimal roughness and maximizing the transfer of energy from the plasma to the substrate.
Thermal Properties:
Titanium’s high melting point (1668°C) and excellent thermal conductivity contribute to its suitability as a sputtering target. The 2N5 purity ensures minimal thermal instability, allowing for stable and efficient operation in high-temperature vacuum environments. Our targets undergo rigorous thermal cycling tests to ensure long-term reliability and consistent performance.
Target Preparation:
Each target goes through a meticulous manufacturing process, involving precise alloying, casting, and heat treatment to achieve the desired purity and mechanical properties. We employ state-of-the-art techniques for shaping and surface preparation, including EDM machining or laser cutting, to achieve the specified dimensions and tolerances.
Applications and Customization:
Our customized round shape titanium sputtering targets find applications in a wide range of industries, including solar panels, microelectronics, optical coatings, and biomedical implants. By offering flexible size options and tailored to your unique requirements, we enable you to optimize the coating process for improved performance and cost-effectiveness.
In conclusion, our round shape titanium sputtering targets with 2N5 purity provide a robust solution for vacuum coating processes. With customizable sizes and exceptional purity, they ensure consistent, high-quality coatings while meeting the specific demands of various industries. Our commitment to precision, quality, and customer satisfaction sets us apart as a reliable partner in your material deposition journey.
(Round shape Titanium sputtering target vacuum coating material 2N5 purity customized size)
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